36 high-power (1 kW to 8 kW) super-high-pressure mercury lamps — OSRAM HBO, USHIO USH, ARC HSA — with published voltage, current, arc gap, dimensions, rated life and the steppers, aligners and exposure tools they are listed for.
| Part number | Power | V | A | Arc gap mm | Ø mm | Life h | Equipment / use |
|---|---|---|---|---|---|---|---|
| Advanced Radiation HSA-1000 KS | 1000 W | 38 | 26.3 | — | 38 | — | Microlithography and UV exposure |
| OSRAM HBO 1000 W/D | 1000 W | 37.7 | 26.5 | 3 | 40 | 600 | SUSS MA150, SUSS MA200, SUSS MA4 |
| USHIO USH-1005D | 1000 W | 38±4 | 28 | 3.0 | 40 | 600 | Lithography: semiconductor, LCD, colour filter, OLED, touch panel and PCB pattern exposure |
| OSRAM HBO 1500 W/CIEL | 1500 W | 23 | 65 | 4 | 52 | 2250 | Canon FPA-2000 i1, Canon FPA-2500 i2, Canon FPA-2500 i3 |
| OSRAM HBO 1500 W/PI | 1500 W | 23 | 65 | 4 | 46 | 850 | ASML PAS 5500/100C, ASML PAS 5500/100D |
| OSRAM HBO 1500 W/PIL | 1500 W | 23 | 65.2 | 4 | 46 | 1500 | ASML PAS 5500/100C, ASML PAS 5500/100D, ASML TFH 100 |
| OSRAM HBO 2000 W/NIL | 1750 W | 26 | 67 | 4.5 | 52 | 1500 | Nikon NSR-2005 i8A |
| OSRAM HBO 2001 W/NIEL | 1750 W | 26 | 67 | 4.5 | 52 | 2250 | Nikon NSR-2005 i9C, Nikon NSR-2005 i10, Nikon NSR-2205 i11C |
| OSRAM HBO 2002 W/NIL | 1750 W | 26 | 67 | 4.5 | 52 | 1500 | Nikon NSR-2205 i11 |
| Advanced Radiation HSA-2002 TAM | 2000 W | 66 | 30 | — | 45 | — | UV exposure and microlithography |
| OSRAM HBO 2001 W/CIL | 2000 W | 26 | 77 | 4.5 | 62 | 1500 | Canon FPA-3000 i4, Canon FPA-3000 i5, Canon FPA-3000 i5+ |
| OSRAM HBO 2002 W/MA | 2000 W | 37 | 54 | 3 | 62 | 1000 | Canon MPA-500, Canon MPA-501, Canon MPA-600 Super |
| OSRAM HBO 2011 W/NIL | 2000 W | 25 | 80 | 4.5 | 52 | 1500 | Nikon NSR-2205 i12C, Nikon NSR-2205 i12D, Nikon NSR-TFH i12 |
| USHIO USH-2002MA | 2000 W | — | — | — | 61 | 1000 | Canon MPA-500, Canon MPA-501, Canon MPA-600 Super |
| USHIO USH-2004MB | 2000 W | 37 | 54 | 3.0 | 62 | 500 | Lithography: semiconductor, LCD and PCB pattern exposure |
| OSRAM HBO 2500 W/PIL | 2500 W | 28 | 90 | 6.7 | 62 | 1500 | ASML PAS 5500/200 |
| OSRAM HBO 2501 W/NIL | 2500 W | 23 | 110 | 4.5 | 70 | 1500 | Nikon NSR-4425i |
| OSRAM HBO 2510 W/NIL | 2500 W | 23 | 110 | 4.5 | 70 | 1500 | Nikon NSR-2205 i14E |
| OSRAM HBO 2700 W/CIL | 2700 W | 24.5 | 110 | 4.5 | 62 | 1500 | Canon FPA-3000 i5+ |
| OSRAM HBO 3500 W/PI | 3400 W | 23 | 148 | 4.5 | 77 | 850 | ASML PAS 5500/200B, ASML PAS 5500/250C |
| OSRAM HBO 3500 W/PIL | 3400 W | 23 | 148 | 4.5 | 77 | 1500 | ASML PAS 5500/200B, ASML PAS 5500/250C |
| OSRAM HBO 3501 W/PI | 3400 W | 23 | 148 | 4.5 | 77 | 850 (PIL version 1500) | ASML PAS 5500/400 |
| Advanced Radiation HSA-3500 TAM | 3500 W | 55 | 64 | — | 71 | — | Microlithography (semiconductor production) |
| OSRAM HBO 3500 W/HK | 3500 W | 55 | 63 | 7.0 | 70 | 1000 | UV exposure and lithography ('other systems') |
| OSRAM HBO 3500 W/MR | 3500 W | 62 | 56 | 7.0 | 70 | 750 | MRS Series 4500 Panel Printer |
| USHIO USH-3502MA | 3500 W | 62 | 56 | 6.6 | 70 | 700 | Lithography: semiconductor, LCD and PCB pattern exposure |
| OSRAM HBO 4000 W/PL | 4000 W | 38–42 | 92.5–95 | 5 | 77 | 1000 | SVGL Micrascan II |
| OSRAM HBO 4300 W/N | 4300 W | 45 | 96 | 5 | 80 | 750 | Nikon FX-501 D3, Nikon FX-501 D4, Nikon FX-601F |
| Advanced Radiation HSA-5000 TAM | 5000 W | 58 | 86 | — | 86 | — | UV exposure and lithography |
| OSRAM HBO 5000 W/C | 5000 W | 56 | 77 | 5 | 82 | 500 | Canon MPA-5000 |
| OSRAM HBO 5000 W/HK | 5000 W | 70 | 72 | 7.5 | 82 | 850 | UV exposure and lithography ('other systems') |
| OSRAM HBO 5000 W/MF | 5000 W | 50 | 100 | 7.5 | 80 | 850 | UV exposure and lithography ('other systems') |
| OSRAM HBO 5000 W/S | 5000 W | 50 | 100 | 7.5 | 80 | — | UV exposure and lithography ('other systems') |
| OSRAM HBO 5000 W/TA | 5000 W | 50 | 100 | 7.5 | — | 850 | UV exposure and lithography ('other systems') |
| OSRAM HBO 5001 W/F | 5000 W | 62 | 80 | 7.5 | 85 | 850 | UV exposure and lithography ('other systems') |
| USHIO USH-8000TO | 8000 W | — | — | — | 110 | — | Semiconductor lithography (wafers, ICs) and LCD exposure |
Many exposure lamps are made to a tool maker's own part number. Send a photo of the label and your exposure machine model — we identify it and quote within 24 hours.
A quartz lamp with a few millimetres between two tungsten electrodes, filled with mercury and an inert starting gas. Running at tens of atmospheres, it emits strong UV lines (g-line 436 nm, h-line 405 nm, i-line 365 nm) used to expose photoresist in lithography, PCB, LCD and MEMS production.
No. Collimated and projection exposure tools use short-arc mercury lamps, but many contact PCB and printing-plate exposure units use long-arc metal-halide lamps. Check the lamp you have: a short-arc lamp has a round bulb with two electrodes almost touching; a long-arc lamp is a long tube.
We supply compatible replacement lamps matched to the original part's electrical data and dimensions, and quote against the part number you send. We do not claim interchangeability between brands without checking base, cable, length and light-centre length.
Data compiled from OSRAM HBO microlithography technical guides (1999–2001 editions and current datasheets), USHIO published specifications and the ARC HSA catalogue. Older types may be discontinued. Brand names belong to their owners and are used for identification only.